| 发明名称 |
PRODUCTION OF SEMICONDUCTOR DEVICE |
| 摘要 |
PURPOSE:To use stacking fault patterns as a mark for mask position alignment by beforehand forming nuclei of stacking faults to a specified shape in specific positions on a substrate. |
| 申请公布号 |
JPS5347764(A) |
申请公布日期 |
1978.04.28 |
| 申请号 |
JP19760121927 |
申请日期 |
1976.10.13 |
| 申请人 |
HITACHI LTD |
发明人 |
TOCHIKUBO HIROO;YASUDA SADAO;KANAI AKIRA |
| 分类号 |
C30B25/02;H01L21/20;H01L21/205;H01L21/66;H01L21/68 |
主分类号 |
C30B25/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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