发明名称 PRZYRZAD POLPRZEWODNIKOWY WYSOKONAPIECIOWY
摘要 A high voltage semiconductor device structure comprises a novel edge contour which directly contributes to increased voltage handling capability. Such a structure may further comprise a collector region shaped in coordination with the edge contour to provide a device having higher voltage capability.
申请公布号 PL200347(A1) 申请公布日期 1978.04.24
申请号 PL19770200347 申请日期 1977.08.18
申请人 发明人
分类号 H01L29/73;H01L21/331;H01L23/31;H01L29/06;H01L29/08;H01L29/74;H01L29/861;(IPC1-7):H01L/ 主分类号 H01L29/73
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