| 发明名称 |
PHOTOGRAPHIC LIGHT SENSITIVE MATERIAL |
| 摘要 |
PURPOSE:To improve a hard mark for photo-mask without being influenced by the composition on treating requirements of a supporting substrate by laminating a Cr thin layer, a Cr2O3 layer of specific thickness, and a silver halide emulsion layer on a transparent substrate. |
| 申请公布号 |
JPS5341220(A) |
申请公布日期 |
1978.04.14 |
| 申请号 |
JP19760115412 |
申请日期 |
1976.09.28 |
| 申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
SATOU MASAMICHI;FUJII ITSUO |
| 分类号 |
G03C5/00;G03C1/91;H01L21/027 |
主分类号 |
G03C5/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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