首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
FILTER FUER TABAKRAUCHWAREN
摘要
申请公布号
DE2745028(A1)
申请公布日期
1978.04.13
申请号
DE19772745028
申请日期
1977.10.06
申请人
BRITISH-AMERICAN TOBACCO CO.LTD.
发明人
GEORGE HORSEWELL,HENRY;DAVID GREEN,JOHN;ANTHONY LUKE,JOHN;MAIDEN CANDLISH,STANLEY
分类号
A24D3/04;(IPC1-7):A24C1/04;A24C5/50
主分类号
A24D3/04
代理机构
代理人
主权项
地址
您可能感兴趣的专利
A MEASURING APPARATUS FOR MEASURING PROPERTIES OF A SURFACE
PROCESS FOR METALLISING A POLYMERIC SURFACE
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
METHOD OF MAKING TRANSISTOR HAVING METAL DIFFUSION BARRIER
THIN FILM DEVICE WITH PROTECTIVE LAYER
SEMICONDUCTOR STRUCTURE
PROCESS FOR PRODUCING MOS TRANSISTORS HAVING A LARGER CHANNEL WIDTH FROM AN SOI AND IN PARTICULAR FDSOI SUBSTRATE, AND CORRESPONDING INTEGRATED CIRCUIT
SEMICONDUCTOR APPARATUS
ORGANIC LIGHT-EMITTING DEVICE AND ORGANIC DISPLAY DEVICE
ELECTROLUMINESCENT DEVICE, ITS MANUFACTURING METHOD, DISPLAY SUBSTRATE AND DISPLAY DEVICE
LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME
IMAGE SENSOR
SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS
DUAL GATE TFT SUBSTRATE STRUCTURE UTILIZING COA SKILL
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
PREVENTING STRAINED FIN RELAXATION
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
METHOD FOR FORMING SOURCE/DRAIN CONTACTS DURING CMOS INTEGRATION USING CONFINED EPITAXIAL GROWTH TECHNIQUES AND THE RESULTING SEMICONDUCTOR DEVICES
SEMICONDUCTOR DEVICES AND PACKAGES INCLUDING CONDUCTIVE UNDERFILL MATERIAL AND RELATED METHODS