| 摘要 |
PURPOSE:To obtain a gallium arsenic substrate favorable inprocessing accuracy excellently in reproducibility without practical evil such as corrosion of a polishing device, etc., by adjusting pH to 2-3. CONSTITUTION:In abrasive powder for gallium arsenic substrate which contains sodium hypochlorite, pH is adjusted to 2-3. At this time, for pH adjustment sodium dihydrogenphosphate and phosphoric acid are used. |
