发明名称 CHEMICAL GAS PHASE REACTION FURNACE
摘要 PURPOSE:To minimize the occurrence of turbulent flow of the gas and to form the accumulated layer of the uniform film thickness with a good yield, by controlling the flow of the reaction gas to the same direction as the convection current of the reaction gas occurring in the furnace.
申请公布号 JPS5337185(A) 申请公布日期 1978.04.06
申请号 JP19760110800 申请日期 1976.09.17
申请人 HITACHI LTD 发明人 KANAI AKIRA;YASUDA SADAO
分类号 C30B25/14;B01J19/00;C23C16/44;C23C16/455;H01L21/205 主分类号 C30B25/14
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