发明名称 PHOTOSENSITIVE COMPOSITION
摘要 This invention relates to a photosensitive composition comprising an ester or an amide of an o-naphthoquinone diazide sulfonic or carboxylic acid and, based on the amount of this compound, about 1 to 50 per cent by weight of an organic dye capable of salt formation and about 5 to 75 per cent by weight of a photosensitive halogen-containing compound which releases acid upon exposure to light and having one of the general formulae I or II <IMAGE> I <IMAGE> II in which Ra is an aryl group or a heterocyclic group which may be substituted, Rb is a trihaloalkyl group or a trihaloalkenyl group having from 1 to 3 carbon atoms, and n is 1, 2 or 3.
申请公布号 JPS5336223(A) 申请公布日期 1978.04.04
申请号 JP19770109779 申请日期 1977.09.12
申请人 HOECHST AG 发明人 PAURU SHIYUTAARUHOOFUEN
分类号 G03C1/72;G03C5/00;G03F7/004;G03F7/022;G03F7/105;H01L21/027 主分类号 G03C1/72
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