发明名称 PHOTORESIST
摘要 PURPOSE:To lessen the difference of thickness between a central portion and a circumference portion, facilitate control of conditions of exposure, development, or the like, and decrease short-circuit, disconnection, and other defects, by coating the diluent of a photoresist fluid in the first place in coating using a spinner.
申请公布号 JPS5333115(A) 申请公布日期 1978.03.28
申请号 JP19760107481 申请日期 1976.09.08
申请人 CITIZEN WATCH CO LTD;KAWAGUCHIKO SEIMITSU KK 发明人 KONDOU SHINICHI;SUZUKI TADASHI;KUROBE YOSHIKI
分类号 G03C1/74;B05D1/40;G03F7/16;H01L21/027 主分类号 G03C1/74
代理机构 代理人
主权项
地址