发明名称 |
FULL FACE EXPOSURE APPARATUS |
摘要 |
PURPOSE:To evenly radiate the surface being radiated of a fixed area by dividing a reflecting mirror used for a full face exposure apparatus to at least two or more parts and further bending the specified portions of the respective reflecting mirrors. |
申请公布号 |
JPS5331975(A) |
申请公布日期 |
1978.03.25 |
申请号 |
JP19760107141 |
申请日期 |
1976.09.06 |
申请人 |
SHARP KK |
发明人 |
ITOU IKUO;SHIMIZU KOUICHI |
分类号 |
H01L21/027;H01L21/302 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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