发明名称 FULL FACE EXPOSURE APPARATUS
摘要 PURPOSE:To evenly radiate the surface being radiated of a fixed area by dividing a reflecting mirror used for a full face exposure apparatus to at least two or more parts and further bending the specified portions of the respective reflecting mirrors.
申请公布号 JPS5331975(A) 申请公布日期 1978.03.25
申请号 JP19760107141 申请日期 1976.09.06
申请人 SHARP KK 发明人 ITOU IKUO;SHIMIZU KOUICHI
分类号 H01L21/027;H01L21/302 主分类号 H01L21/027
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