发明名称 MASK FOR XXRAY EXPOSURE
摘要 <p>PURPOSE:To produce a mask of uniform mask substrate within windows which permits mask alignment visibly by making X-ray absorptive patterns on the sapphire layer on one surface of a single crystal substrate, and removing the corresponding portions from the back.</p>
申请公布号 JPS5330277(A) 申请公布日期 1978.03.22
申请号 JP19760104528 申请日期 1976.09.01
申请人 FUJITSU LTD 发明人 MIWA TAKAAKI;INAGAKI TAKESHI;FUNAYAMA TOORU
分类号 H01L21/027;H01L21/302 主分类号 H01L21/027
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