| 发明名称 |
DEVELOPING LIQUID FOR RADIANT RAY RESIST |
| 摘要 |
PURPOSE:To improve reproducibility of irradiation pattern irradiated on resist by use of a developing liquid corresponding to the molecular weight of a polymethylmethacrylate used as resist. |
| 申请公布号 |
JPS5330330(A) |
申请公布日期 |
1978.03.22 |
| 申请号 |
JP19760104788 |
申请日期 |
1976.09.01 |
| 申请人 |
FUJITSU LTD |
发明人 |
KITAKOUJI SHIYUNU;YONEDA YASUHIRO;FUJIMORI MASATOSHI |
| 分类号 |
G03F7/20;G03F7/039;G03F7/30;G03F7/32;H01L21/027;H01L21/30 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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