| 发明名称 |
WAFER FIXING METHOD OF PROJECTION TYPE EXPOSURE APPARATUS |
| 摘要 |
PURPOSE:To bond and fix wafers to an elastic flat plate without impairing their flatness and prevent out-of-focus by interposing viscous grease between the wafer back and the elastic flat plate. |
| 申请公布号 |
JPS5330276(A) |
申请公布日期 |
1978.03.22 |
| 申请号 |
JP19760103733 |
申请日期 |
1976.09.01 |
| 申请人 |
FUJITSU LTD |
发明人 |
IGARASHI KOUJI;MAJIMA TEIJI |
| 分类号 |
H01L21/30;H01L21/027;H01L21/68 |
主分类号 |
H01L21/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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