PHOTOSENSITIVE MATERIAL FOR LITHOGRAPHY,申请号JP19810123325-传众专利搜索

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发明名称	PHOTOSENSITIVE MATERIAL FOR LITHOGRAPHY
摘要
申请公布号	JPS5824149(A)	申请公布日期	1983.02.14
申请号	JP19810123325	申请日期	1981.08.06
申请人	FUJI SHASHIN FILM KK	发明人	NAKAYAMA TAKAO;NAKAO SHIYOU;OOISHI CHIKASHI;SHIBA KEISUKE
分类号	G03G13/28;G03G5/14	主分类号	G03G13/28
代理机构		代理人
主权项
地址

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