| 发明名称 |
Process for stripping resist layers from substrates |
| 摘要 |
Organic polymer resist layers are stripped from substrates by treating the layers with a mixture of an aldehyde or a ketone and an alcoholic solution of a compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates.
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| 申请公布号 |
US4078102(A) |
申请公布日期 |
1978.03.07 |
| 申请号 |
US19760736971 |
申请日期 |
1976.10.29 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BENDZ, DIANA JEAN;BENDZ, GERALD ANDREI |
| 分类号 |
H01L21/30;C09D9/00;G03F7/00;G03F7/42;H01L21/027;(IPC1-7):B44D1/44;B08B7/00;C23D17/00 |
主分类号 |
H01L21/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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