| 摘要 |
PURPOSE:To extent the range of application of a reticle by forming plural various kinds of alignment mark on the reticle. CONSTITUTION:A light shielding film 2 consisting of chromium or the like is stuck to a transparent substrate 1 cconsisting of quartz or the like, and a pattern area 3 where a prescribed pattern is formed is formed in the about center part of the light shielding film 2, and plural kinds of alignment mark 4, 4a, and 4b are formed around the pattern area 3, and wafer alignment marks 5 are formed around the light sheilding film 2. That is, alignment marks 4 corresponding to the classification f a layer are formed on the left of the pattern area 3, and alignment marks 4a corresponding to the diameter of an applied wafer are formed on the right, and alignment marks 4b corresponding to the classification of a used exposure device are formed under the area 3. |
