| 摘要 |
<p>PURPOSE:To arrange radiation parts for charged particles in an optional pattern and also extend their length, by arranging a means facing a charged particlesgeneration source to deflect or absorb charged particles such as electrons and ions. CONSTITUTION:Respective fetch electrodes of substrates SU-1 through SU-4 are divided into 2 groups like PE1.m, PE2.m(m=1,2, 3, 4). And, positive potential VPEn'm is applied to the fetch electrodes in such a way as to satisfy VPE1.1< VPE2.1:VPE1.2>VPE2.2:VPE1.3<VPE2.3:VPE1.4>VPE2.4. Then, electron beams radiated from axes X1 and X2 are deflected toward X0 direction. As a result, electron beams can be taken out from AEn, 1 through AEn, 4 provided at fixed intervals on the axis X0 of an accelerating electrode AE. Thus, multiple electron beam sources effectively arranged in a straight line can be obtained. While electron beam sources effectively arranged at equal intervals and in extended length like this can be obtained, not only an electron beam sources arrangement at equal intervals in a straight line but their optional arrangement. is also made possible.</p> |
