发明名称 Deep diode devices and method and apparatus
摘要 Deep diodes which extend in straight lines through a silicon wafer are produced by migrating aluminum droplets through the wafer while maintaining a finite temperature gradient through the wafer in the direction of straight line droplet travel, and at the same time maintaining a zero temperature gradient through the wafer in a direction normal to the droplet travel course. Unidirectional heat flow apparatus implementing this method is also disclosed.
申请公布号 US4075038(A) 申请公布日期 1978.02.21
申请号 US19750552154 申请日期 1975.02.24
申请人 GENERAL ELECTRIC COMPANY 发明人 ANTHONY, THOMAS R.;CLINE, HARVEY E.
分类号 H01L21/18;H01L21/24;(IPC1-7):H01L29/04;H01L7/00 主分类号 H01L21/18
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