Cathodic sputtering appts. - using several work stations where screens isolate sputtered materials

摘要

A cathodic sputtering appts. has a vacuum chamber contg. several work stations for cleaning, etching, or coating substrates mounted in at least one holder travelling between the stations, each of which contains electrodes. A screen is used between each pair of electrodes, leaving a gap which permits substrate travel; and each screen has side flanges with a width >=3 (pref. 5) times the gap width. The sputtering cathodes are pref. arranged in a circle, and the substrate holder is rotated so that the substrates can be aligned under each cathode; and the side flanges on the screens are pref. parallel with the surfaces of the electrodes. The flanges are pref. circular, and may be provided with projecting ring ribs.