| 发明名称 |
PHOTOGRAPHIC EXPOSURE METHOD |
| 摘要 |
PURPOSE:To increase a developing rate and shorten the developing time, by forming a posiive resist on a substrate and subsequently allowing to stand in vacuo. |
| 申请公布号 |
JPS5316631(A) |
申请公布日期 |
1978.02.15 |
| 申请号 |
JP19760090177 |
申请日期 |
1976.07.30 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
MATSUMOTO YASUO |
| 分类号 |
G03B27/02;G03C5/08;G03F7/20;G03F7/38;H01L21/02;H01L21/027 |
主分类号 |
G03B27/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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