MASKING PROCESS WITH CONSTRICTED FLOW PATH FOR COATING

摘要

A masking process, during the vapor deposition coating of a partially masked substrate with a condensible vaporous precursor of a coating material, which comprises causing the vaporous precursor to flow through a constricted flow path at the masked/unmasked interface during the coating process so as to provide a relatively thin coating at the end of the flow path which can be used as a tear line for removing the coating masking means along such interface.