| 发明名称 |
4-HYDROXYPHENYL-3,4-DIHYDROXYPHENYLMETHANE, ITS PRODUCTION AND POSITIVE-TYPE RESIST COMPOSITION CONTAINING THE SAME |
| 摘要 |
NEW MATERIAL:4-Hydroxyphenyl-3,4-dihydroxyphenylmethane of formula. USE:A positive-type resist. It has excellent resolution and pattern form (profile). PREPARATION:The compound of formula can be produced by reacting catechol with p-hydroxybenzyl alcohol. |
| 申请公布号 |
JPH02282342(A) |
申请公布日期 |
1990.11.19 |
| 申请号 |
JP19880330505 |
申请日期 |
1988.12.26 |
| 申请人 |
SUMITOMO CHEM CO LTD |
发明人 |
TOMIOKA ATSUSHI;NAKANISHI HIROTOSHI;KUWANA KOJI;KAMIYA YASUNORI;HANABATAKE MAKOTO;OOI SATSUO |
| 分类号 |
G03F7/023;B01J27/06;C07B61/00;C07C37/16;C07C39/15;C07C39/16;G03F7/022;H01L21/027;H01L21/30 |
主分类号 |
G03F7/023 |
| 代理机构 |
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