发明名称 |
PROJECTION EXPOSURE APPARATUS |
摘要 |
PURPOSE:To enable intermittent variation of a focal length without shifting an image surface vertically, by varying the focal length by providing a transparent plate having different thicknesses between a projection lens and the image surface. CONSTITUTION:A transparent plate 3 having different thicknesses is provided between a lens 1 and an image surface 2 and a focal length is varied by varying the thicknesses. According to this constitution, an optical path is shortened by d-d/n by the transparent plate 3 of a thickness (d) having a refractive index (n) of light, and therefore the focal length can be varied by varying the thickness of the transparent plate 3. Since a focal depth can be varied without shifting the image surface vertically according to this constitution, a projection exposure apparatus enabling attainment of a high throughput can be obtained. |
申请公布号 |
JPH02281725(A) |
申请公布日期 |
1990.11.19 |
申请号 |
JP19890103840 |
申请日期 |
1989.04.24 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
HIRAI YOSHIHIKO;MATSUOKA KOJI;SASAKO MASARU;NOMURA NOBORU |
分类号 |
H01L21/30;G03F7/20;H01L21/027 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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