| 摘要 |
A polishing wheel is provided which comprises a circular rotatable body, a plurality of spaced apart rigid support members provided on the periphery of the rotatable body, a layer of resilient material provided on the periphery of each said support member and a strip covered with abrasive material supported on each layer of resilient material. The abrasive strip is secured on the support member by means for regulating the tension of said strip. A plurality of cylindrical members may be provided for retaining the ends of the strips between said cylindrical members and the inner side of the support member, each said cylindrical member being mounted eccentrically in a bore in the circular rotatable body and being locked by a screw. Alternatively, the abrasive strip may be continuous and form a sleeve engaged on the support member and on a cylindrical member mounted eccentrically on the body.
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