| 摘要 |
PROBLEM TO BE SOLVED: To obtain a compsn. undergoing a slight change in sensitivity after preparation and useful as a chemical amplification type resist excellent in sensitivity, resolution, pattern shape and process stability by incorporating a copolymer having a specified structure, a radiation sensitive acid generating agent and an acid diffusion controlling agent. SOLUTION: This compsn. contains a copolymer contg. repeating units represented by formula I by 10-50mol% of all repeating units, a radiation sensitive acid generating agent selected from among onium salt compds., sulfonimido compds., sulfone compds., sulfonic ester compds., quinonediazido compds. and diazomethane compds. and an acid diffusion controlling agent. In the formula I, R<1> is H or methyl, R<2> is 1-4C alkyl or 1-4C alkoxyl, each of R<3> and R<4> is 1-10C alkyl, 3-10C cycloalkyl, etc., and (n) is an integer of 0-4. Various additives such as a surfactant and a sensitizer may be added if necessary. |
