摘要 |
1336241 Removing metals from liquids or gases OSAKA SODA CO Ltd 5 Jan 1971 [5 Feb 1970 26 Feb 1970 (2) 13 April 1970 7 Aug 1970] 469/71 Headings C1A and C1C A process for removing metals from a gaseous or liquid metal-containing material comprises contacting the material with a carrier on which is adsorbed an organic compound which is capable of forming a mercaptide of the metal to be removed and which either contains an -SM group where M = H or alkali metal or an group or is an N, N<SP>1</SP>-substituted thiourea in which the substituents are bonded to nitrogen through carbon atoms. The carrier may also have adsorbed thereon an organic compound which is capable of forming a chelate of the metal to be removed and which contains an -OH group and -N = and/or -NH 2 groups. The material may be treated with an anion exchange resin prior to treatment with the carrier. The metal-containing material may be an aqueous alkali solution, hydrochloric acid, hydrogen, air or a waste gas or water formed in the smelting, plating and chemical industries. The metal to be removed may be Hg, Au, Bi, Cd, Co, Cr, Cu, Ni, Pb, Zn, Ag, Mu, Fe, Mo, Ti, Mg and Al. The carrier may be active carbon, bone black, silica gel, silica/alumina gel, zeolite, alumina, magnesia and sand. Compounds which may be adsorbed on the carrier include 2-aminoethanethiol, butylmercaptan, cyclohexylamine salt of a mercaptobenzothiazole, L-cysteine, 2,3-dimercapto-1-propanol, glutathione, 2 mercaptobenzothiazole and its alkali metal salts, 2- mercaptoethanol, dl-mercaptosuccinic acid, pipecolinepipecolyl dithiocarbamate, piperidine pentamethylene dithiocarbamate, thioacetic acid, thioglycolic acid and its alkali metal salts, thionalide, thiophenol and its alkali metal salts, isopropyl xanthic acids and its alkali metal salts, Bismuthiol II, p-dimethyl-aminobenzylidenerhodanine, phenylene-, ethylene-diphenyl-, diorthotolyl- and trimethyl-thiourea, anthranilic acid, 8-hydroxyquinoline acid 8-hydroxyquinaldine. |