发明名称 |
Process for producing radioisotope source |
摘要 |
A process for implanting radioisotope ions into a substrate to create a radioisotope source, utilizing the chemical binding of selected ions to the surface of the substrate. Extraneous material not chemically bound to the substrate is removed and the chemically bound ions are diffused below the surface of the substrate in a non-oxidizing environment.
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申请公布号 |
US5851315(A) |
申请公布日期 |
1998.12.22 |
申请号 |
US19970895092 |
申请日期 |
1997.07.16 |
申请人 |
ISO-SCIENCE LABORATORIES, INC. |
发明人 |
STRATHEARN, GARY;TAGHIZADEH, SEYED K. |
分类号 |
C23C8/42;C23C10/20;(IPC1-7):C23C8/36 |
主分类号 |
C23C8/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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