发明名称 |
Process control circuit for metal-depositing baths |
摘要 |
A process control circuit which is adapted for the control and monitoring of a plurality of parameters in one or more metal-depositing baths, has parameter control circuit blocks for each of the parameters to be measured. Each of the parameter control circuit blocks has a measuring stage for producing a measured value corresponding to one of the parameters, a calibration stage for calibrating the measuring stage, a comparison stage for comparing the measured value to a stored nominal value, and a dosing circuit which is connected to the comparator and which doses the metal-depositing bath in response to a comparison signal from the comparator.
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申请公布号 |
US4068677(A) |
申请公布日期 |
1978.01.17 |
申请号 |
US19760688784 |
申请日期 |
1976.05.21 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
DE STEUR, HUBERT;PERNEGGER, WOLFGANG;BUSSMANN, EGON |
分类号 |
G05B19/02;C25D21/12;G01N33/20;G05B23/02;G05D21/00;G05D21/02;(IPC1-7):G05D11/13;C25B15/02;C25D21/14 |
主分类号 |
G05B19/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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