发明名称 Process control circuit for metal-depositing baths
摘要 A process control circuit which is adapted for the control and monitoring of a plurality of parameters in one or more metal-depositing baths, has parameter control circuit blocks for each of the parameters to be measured. Each of the parameter control circuit blocks has a measuring stage for producing a measured value corresponding to one of the parameters, a calibration stage for calibrating the measuring stage, a comparison stage for comparing the measured value to a stored nominal value, and a dosing circuit which is connected to the comparator and which doses the metal-depositing bath in response to a comparison signal from the comparator.
申请公布号 US4068677(A) 申请公布日期 1978.01.17
申请号 US19760688784 申请日期 1976.05.21
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 DE STEUR, HUBERT;PERNEGGER, WOLFGANG;BUSSMANN, EGON
分类号 G05B19/02;C25D21/12;G01N33/20;G05B23/02;G05D21/00;G05D21/02;(IPC1-7):G05D11/13;C25B15/02;C25D21/14 主分类号 G05B19/02
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