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发明名称
MASK ALIGNMENT METHOD TO SEMICONDUCTOR SUBSTRATE
摘要
PURPOSE:To facilitate final alignment by providing rough alignment patterns outside of effective chip regions, using the effective regions in element formation and performing highly accurate rough alignment with the two patterns.
申请公布号
JPS534476(A)
申请公布日期
1978.01.17
申请号
JP19760077856
申请日期
1976.07.02
申请人
FUJITSU LTD
发明人
ABE SHIGEHARU;SUGISHIMA KENJI;TAMURA HIDEO
分类号
H01L21/027;H01L21/302
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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