首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
PROCEDE POUR REALISER L'AJUSTEMENT DE MASQUES D'EXPOSITION PAR RAPPORT A UNE PASTILLE DE SUBSTRAT
摘要
申请公布号
BE858958(A1)
申请公布日期
1978.01.16
申请号
BE19770181125
申请日期
1977.09.22
申请人
SIEMENS A.G.
发明人
分类号
G03B27/32;G03F9/00;H01L21/027;H05K3/00;(IPC1-7):H01L/
主分类号
G03B27/32
代理机构
代理人
主权项
地址
您可能感兴趣的专利
TERMINAL CRIMP STRUCTURE AND TERMINAL CRIMP METHOD, AND CRIMP TERMINAL USED FOR SUCH A STRUCTURE AND METHOD
METHOD AND DEVICE FOR DRY CONDITION GAS SEAL COOLING
BROADCASTING SIGNAL RECEIVER
ELECTRONIC EQUIPMENT WITH BUILT-IN INFORMATION RECORDING AND REPRODUCING DEVICE
SIGNAL PROCESSOR FOR CHARGE COUPLED DEVICE
SOLID-STATE IMAGE PICKUP DEVICE
VIDEO INTERFACE
ELECTRONIC SCALE WITH COMMUNICATION FUNCTION
SUBSCRIBER CIRCUIT CONTROL SYSTEM
HIGH FREQUENCY ATTENUATION CIRCUIT
TEST METHOD OF IC AND ITS PROBE CARD
STRUCTURE OF CLOCK WINDOW
DISCOUNT SEAL FOR BAR CODE AND ITS USING METHOD
ELECTRONIC EQUIPMENT
SERVO CONTROL CIRCUIT OF SPINDLE MOTOR FOR DRIVING DISK
FIXING DEVICE
IMAGE FORMING DEVICE
Process for the preparation of 3-arylbenzofuranones
Benzofuran-2-ones as stabilisers
Process for the recovery of the metallic phase from dispersed mixtures of light metals and non-metallic components
