发明名称 TESTING STRUCTURE
摘要 A complex test structure for integrated, semiconductor circuits in which the impurity regions of the test device are elongated, preferably in serpentine fashion. The elongated impurity regions emulate corresponding regions in regular integrated circuit devices. Additional regions are provided, each in elongated form, which, when impressed with appropriate voltages or currents, provide indications of defect levels and product yield in the regular devices. Advantageously, the serpentine test structure is fabricated on the same wafer and with the same process steps as the regular integrated circuit chips. In one embodiment, a plurality of such monitors are provided adjacent each other in the same test site. Regions in one monitor are selectively connected to regions in another monitor and to external contact pads by contact stations disposed between each monitor.
申请公布号 JPS533775(A) 申请公布日期 1978.01.13
申请号 JP19770064952 申请日期 1977.06.03
申请人 IBM 发明人 JIEEMUSU SHIITAN RII;BAANTO KURUTO JIIGUFURIIDO RES;AKERA BENKATA SURIYA SATAYA
分类号 H01L21/822;G01R31/28;H01L21/331;H01L21/66;H01L23/544;H01L27/04;H01L29/73 主分类号 H01L21/822
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