发明名称 QUARTZ CHAMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a quartz chamber, for a semiconductor manufacturing apparatus, which realizes an adhesive part which can make an O-ring long-lived. SOLUTION: The figure shows the adhesive part of the flange face of the quartz chamber 13 which uses the O-ring 10 to an installation base 11. A groove 12 is formed on the installation base 11 in order to fix the O-ring 10. A step part 14, which protects at least the inside part of the O-ring 10, is formed on the side of the flange face of the quartz chamber 13. The quartz chamber 13 is constituted, in such a way that when the inside of the quartz chamber is set to low-pressure conditions, the separation distance between the chamber-side flange face 131 of the quartz chamber 13 and the installation base 11 is nearly eliminated by the step part 14.</p>
申请公布号 JP2002164327(A) 申请公布日期 2002.06.07
申请号 JP20000359874 申请日期 2000.11.27
申请人 SEIKO EPSON CORP 发明人 DENDA ATSUSHI
分类号 C03B20/00;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 主分类号 C03B20/00
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