发明名称 |
SUPPORT WITH INTEGRATED DEPOSIT OF GAS ABSORBING MATERIAL FOR MANUFACTURING MICROELECTRONIC, MICROOPTOELECTRONIC OR MICROMECHANICAL DEVICES |
摘要 |
<p>The specification teaches a device for use in the manufacturing of microelectronic, microoptoelectronic or micromechanical devices (microdevices) in which a contaminant absorption layer improves the life and operation of the microdevice. In a preferred embodiment the invention includes a mechanical supporting base, and a layer of a gas absorbing or purifier material is deposited on the base by a variety of techniques and a layer for temporary protection of the purification material is placed on top of the purification material. The temporary protection material is compatible for use in the microdevice and can be removed during the manufacture of the microdevice.</p> |
申请公布号 |
EP1410433(B1) |
申请公布日期 |
2005.03.23 |
申请号 |
EP20020787170 |
申请日期 |
2002.07.16 |
申请人 |
SAES GETTERS S.P.A. |
发明人 |
AMIOTTI, MARCO |
分类号 |
B81B3/00;B01J20/02;B81C1/00;B81C99/00;C23C14/02;C23C16/02;H01G15/00;H01L21/02;H01L21/332;H01L21/68;H01L23/26;(IPC1-7):H01L21/332 |
主分类号 |
B81B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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