| 发明名称 |
ELECTRON BEAM RESIST AND ITS USAGE |
| 摘要 |
PURPOSE:Stable resist having sensitivity to radiation of 2 X 10<-7>C/cm<2>, short radiation time and resistance to ion beam etching by using polymethacrylic amide or its compolymer as its main ingredient. |
| 申请公布号 |
JPS52153672(A) |
申请公布日期 |
1977.12.20 |
| 申请号 |
JP19760071536 |
申请日期 |
1976.06.16 |
| 申请人 |
MATSUSHITA ELECTRIC IND CO LTD;FUJI YAKUHIN KOGYO KK |
发明人 |
MATSUDA SHIYUNSUKE;TSUCHIYA SOUJI;HONMA MASAMI;NAGAMATSU GENTAROU |
| 分类号 |
G03F7/004;C08F2/00;C08F2/48;C08F8/00;C08J3/28;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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