| 发明名称 |
MEASURING METHOD FOR DEGREE OF DETERIORATION OF ETCHING SOLUTIONS |
| 摘要 |
PURPOSE:To wastefulness of an etching solution is prevented and accurate and positive etching is performed by accurately measuring the degree of deterioration from the degree of suspension of the etching solution at the time of producing semiconductor elements. |
| 申请公布号 |
JPS52153494(A) |
申请公布日期 |
1977.12.20 |
| 申请号 |
JP19760069784 |
申请日期 |
1976.06.16 |
| 申请人 |
HITACHI LTD |
发明人 |
YOSHIMI TAKEO;SAKAI HIDEO |
| 分类号 |
G01N21/59;C23F1/08;G01N15/06;H01L21/306;H01L21/308 |
主分类号 |
G01N21/59 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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