发明名称 Negative-resistance semiconductor device
摘要 A pair of field-effect transistors (hereinafter referred to as FETs) of p-channel type and n-channel type, respectively, both to be electrically actuated in a depletion mode, are formed on a single semiconductor substrate, for instance, a single silicon substrate, and both sources or both drains are connected to each other, or the source of one FET and the drain of the other FET are connected to each other, whereby the pair of FETs are series-connected, and the gate electrode of each FET is connected to the drain electrode or the source electrode that is not series connected in the abovementioned way, respectively, of the other FET. When a voltage of specified range is applied across both non-series-connected electrodes, i.e., the two external terminals, the resulting voltage-current characteristic presents a so-called dynatron-type characteristic, producing a negative-resistance phenomenon over a fairly wide range of applied voltage.
申请公布号 US4064525(A) 申请公布日期 1977.12.20
申请号 US19760696389 申请日期 1976.06.15
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 KANO, GOTA;TSUDA, NAOYUKI;IWASA, HITOO
分类号 H01L29/78;G05F3/24;H01L21/331;H01L21/337;H01L21/822;H01L27/04;H01L27/098;H01L29/73;H01L29/80;H01L29/808;H01L29/86;H03H11/52;(IPC1-7):H01L27/02 主分类号 H01L29/78
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