发明名称 Photosensitive composition
摘要 A photosensitive composition is prepared from a mixture of a photosensitive resin containing radicals having the formula <IMAGE> wherein X and Y represent hydrogen, halogen, cyano or nitro, Ar represents an aryl radical or a substituted aryl radical, and n represents 1 or 2, and a solvent having the formula <IMAGE> wherein R and R'' represent a lower alkyl radical and R' represents a lower alkylene radical.
申请公布号 US4063953(A) 申请公布日期 1977.12.20
申请号 US19750637278 申请日期 1975.12.03
申请人 MITSUBISHI CHEMICAL INDUSTRIES, LTD. 发明人 FUKUTANI, HIDEO;MIURA, KONOE;TAKAHASHI, YOSHIHIRO;TORIGE, KAZUO
分类号 C08G81/02;G03F7/038;(IPC1-7):G03C1/68 主分类号 C08G81/02
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