发明名称 |
Photosensitive composition |
摘要 |
A photosensitive composition is prepared from a mixture of a photosensitive resin containing radicals having the formula <IMAGE> wherein X and Y represent hydrogen, halogen, cyano or nitro, Ar represents an aryl radical or a substituted aryl radical, and n represents 1 or 2, and a solvent having the formula <IMAGE> wherein R and R'' represent a lower alkyl radical and R' represents a lower alkylene radical.
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申请公布号 |
US4063953(A) |
申请公布日期 |
1977.12.20 |
申请号 |
US19750637278 |
申请日期 |
1975.12.03 |
申请人 |
MITSUBISHI CHEMICAL INDUSTRIES, LTD. |
发明人 |
FUKUTANI, HIDEO;MIURA, KONOE;TAKAHASHI, YOSHIHIRO;TORIGE, KAZUO |
分类号 |
C08G81/02;G03F7/038;(IPC1-7):G03C1/68 |
主分类号 |
C08G81/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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