发明名称 FLOW CONTROL MEMBER AND SEMICONDUCTOR MANUFACTURING FACILITY WITH IT
摘要 A flow control member and a semiconductor manufacturing facility having the same are provided to maintain the pressure inside a process chamber uniformly by exhausting fluid uniformly. A flow control member(200) includes a housing(210), a gate(220), a driven member. The housing(210) surrounds the components of the flow control member(200), is separably installed on an exhaust line(122), and includes a passage(212). The passage is formed inside the housing to flow fluid therethrough. Both ends of the passage are connected to first and second lines(122a,122b) respectively. The gate adjusts the opening and closing of the passage uniformly to control the flow inside the passage. The driven member drives the gate, and includes a rotating housing(230), a motor(242), and first to third gears(244,246,248). The rotating housing is installed along the edge of the passage, and rotates by the driving power transmitted from the motor through the first and second gears(244,246).
申请公布号 KR20070101450(A) 申请公布日期 2007.10.17
申请号 KR20060032451 申请日期 2006.04.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JANG, CHEOL WON
分类号 H01L21/02 主分类号 H01L21/02
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