发明名称 MASK FOR XXRAY EXPOSURE
摘要 <p>PURPOSE:To reduce the effect of warpage owing to temperature changes and make possible fine working by letting the coefficient of thermal expansion of the material of an X-ray transmission substrate with that of the material of an X-ray absorbing material within 10%.</p>
申请公布号 JPS52149976(A) 申请公布日期 1977.12.13
申请号 JP19760066480 申请日期 1976.06.09
申请人 TOKYO SHIBAURA ELECTRIC CO 发明人 TAKASU SHINICHIROU;SAKURAI SADAO;KOTAKE SHIYUUSUKE
分类号 H01L21/027;H01L21/302 主分类号 H01L21/027
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