发明名称 Vapor desposition method
摘要 Method and apparatus for effecting vapor deposition of a material on an object. The material is vaporized in a closed chamber, and the pressure is allowed to build up in the chamber as the material vaporizes. Thereafter, the chamber is opened, and the vapor is applied to the object in a super-heated, high pressure state. If desired, additional materials can be injected into the chamber and added to the vapor before the chamber is opened.
申请公布号 US4061800(A) 申请公布日期 1977.12.06
申请号 US19760652774 申请日期 1976.01.27
申请人 APPLIED MATERIALS, INC. 发明人 ANDERSON, EMMETT R.
分类号 C23C14/24;C23C14/26;(IPC1-7):B05D3/06 主分类号 C23C14/24
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