发明名称 |
APPARATUS FOR PVD DIELECTRIC DEPOSITION |
摘要 |
Apparatus for physical vapor deposition of dielectric material is provided herein. In some embodiments, a chamber lid of a physical vapor deposition chamber includes an inner magnetron assembly coupled to an inner target assembly, and an outer magnet assembly coupled to an outer target assembly, wherein the inner magnetron assembly and the inner target assembly are electrically isolated from the outer magnet assembly and the outer target assembly. |
申请公布号 |
WO2016099635(A2) |
申请公布日期 |
2016.06.23 |
申请号 |
WO2015US55648 |
申请日期 |
2015.10.15 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
MILLER, KEITH A.;NGUYEN, THANH X.;LAVITSKY, ILYA;SCHMIEDING, RANDY;KOTHNUR, PRASHANTH |
分类号 |
H01L21/203 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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