POLISHING COMPOSITION, POLISHING COMPOSITION PRODUCTION METHOD AND POLISHED MATTER PRODUCTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a polishing composition which can reduce the number of minute defects detected on a surface after polishing.SOLUTION: There is provided a polishing composition comprising abrasive grains, water-soluble polymers and water. The polishing composition has 20 nm-60 nm of a volume-average particle size Dof particles included in the polishing composition measured by dynamic light scattering in such a concentration that a content of the abrasive grains becomes 0.2 mass%.SELECTED DRAWING: None