CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam lithography apparatus which can preventing degradation of drawing accuracy caused by pressure change.SOLUTION: An electron optical lens barrel 301 includes a flange provided around a protrusion and forming a seal portion between the flange and a chamber 300a. The chamber 300a is composed of low thermal expansion material, and the seal portion is composed of low thermal expansion material having concentration of phosphorus and sulfur lower than that of other portions.SELECTED DRAWING: Figure 3