发明名称 WAFER CHUCK FOR MASK ALIGNER
摘要 PURPOSE:To eliminate the shift discrepancy between the mask and wafer at the contact-separation action time and also to reduce the action frequency, by supporting the chuck section of the mask aligner with an elastic disk.
申请公布号 JPS52131474(A) 申请公布日期 1977.11.04
申请号 JP19760047665 申请日期 1976.04.28
申请人 HITACHI LTD 发明人 KOMORIYA SUSUMU;MAEJIMA HIROSHI;YOSHIDA KIYOSHI;NISHIZUKA HIROSHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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