| 发明名称 |
FORMATION OF ETCHINGGLIKE PATTERNS |
| 摘要 |
<p>PURPOSE:To form etching-like patterns in a short time, by coating a substrate having high specular glossiness with transparent colored paint to form a coating film of low specular glossiness.</p> |
| 申请公布号 |
JPS52129741(A) |
申请公布日期 |
1977.10.31 |
| 申请号 |
JP19760046458 |
申请日期 |
1976.04.26 |
| 申请人 |
TOYO INK MFG CO |
发明人 |
TABUCHI EIJI;NAKAJIMA EIJI |
| 分类号 |
B29C65/44;B05D5/06;B29C69/00;B41M1/28;B41M3/06;B44C1/10;B44D5/00;F02P3/05 |
主分类号 |
B29C65/44 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
