| 发明名称 |
GAS PHASE GROWTH REGULATION APPARATUS |
| 摘要 |
PURPOSE:To regulate the thickness of the film with a high accuracy, by receiving the light from a sheet of semiconductive wafer, being situated other than both end and measuring the thickness of the film. |
| 申请公布号 |
JPS52124483(A) |
申请公布日期 |
1977.10.19 |
| 申请号 |
JP19760041272 |
申请日期 |
1976.04.14 |
| 申请人 |
HITACHI LTD |
发明人 |
SUGAWARA KATSUO;YOSHIMI TAKEO |
| 分类号 |
C30B25/16;C23C16/52;H01L21/205 |
主分类号 |
C30B25/16 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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