| 发明名称 |
PRODUCTION OF ELECTRODE SUBSTRATE FOR DISPLAY ELEMENTS |
| 摘要 |
PURPOSE:Etching is performed reliably within a short time regardless to the coating method and conditions of a thin transparent conductive film as well as to its characteristics by performing etching with gas plasmas. |
| 申请公布号 |
JPS52117148(A) |
申请公布日期 |
1977.10.01 |
| 申请号 |
JP19760034035 |
申请日期 |
1976.03.27 |
| 申请人 |
SUWA SEIKOSHA KK |
发明人 |
MIYASAKA TSUGUMITSU |
| 分类号 |
H01L21/302;G02F1/1333;G02F1/1343;G09F9/30;H01L21/3065 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 地址 |
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