| 发明名称 |
METHOD OF DEVELOPING ELECTRONIC BEAM RESIST BY MEANS OF GAS PLASMA |
| 摘要 |
PURPOSE:To develop an electronic beam resist exposed by an electronic beam by making use of a chemical reaction of alcoholic gas plasma. |
| 申请公布号 |
JPS52113163(A) |
申请公布日期 |
1977.09.22 |
| 申请号 |
JP19760026728 |
申请日期 |
1976.03.12 |
| 申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
KATOU TADAO;TOYODA HIROYASU |
| 分类号 |
G03F7/36;H01L21/027;H01L21/302 |
主分类号 |
G03F7/36 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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