发明名称 CLEANING METHOD FOR MASK BLANKS
摘要 PURPOSE:To improve adhesibility of resist by utilizing resist solvent for cleaning of the mask blanks prior to coating. CONSTITUTION:The mask blanks 5 are placed on a stand 2 and rotated by a shaft 3, resist solvent is ejected from a nozzle 6, and with its pressuring force and flowing quantity dust on the blanks 5 is eliminated. Next, after the ejecting of the resist solvent is stopped and spin drying by the shaft 3 is carried out, coating with resist is carried out by dropping resist from the nozzle 4. In this way, the adhesibility of resist is improved and the sticking of dust after cleaning can be prevented.
申请公布号 JPH0320744(A) 申请公布日期 1991.01.29
申请号 JP19890155465 申请日期 1989.06.16
申请人 MATSUSHITA ELECTRON CORP 发明人 OOKA MASATO
分类号 G03F1/50;G03F1/82;G03F7/16 主分类号 G03F1/50
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