| 摘要 |
PURPOSE:To lessen the failure of a pellicle to be generated during handling of the mask and to enhance working efficiency by enclosing a part of the pellicle and transparent substrate to be protected with a protective frame. CONSTITUTION:The photomask is constituted of a supporting frame 3 enclosing the pattern forming region A of the transparent substrate 1, the pellicle 4 to be extended on the supporting frame 3 and the protective film 5 which is mounted at least around the pellicle 4 and projects from the surface to be protected. Patterns 2 are enclosed by the pellicle 4 and a part of the pellicle 4 and transparent substrate 1 to be protected are enclosed by the protective frame 5. The pellicle 4 can, therefore, be parted from an obstruction by the protective frame 5 if the obstruction exists from the side of the transparent substrate 1 to the pellicle 4. The failure of the pellicle 4 to be generated during handling is lessened in this way and the working efficiency is enhanced. |
