| 摘要 |
A patterning device employs an elongated strip which is fixed between an operating element, such as a guide bar of a warp knitting machine, and a fixed support point. In addition, the patterning device has a displacing element in the form of a rotatable eccentric or a reciprocally mounted roller which is used to deflect the strip between two points intermediately of the length of the strip so as to exert a pulling force on the guide bar. The amount of deflection of the strip determines the amount of movement of the guide bar. The guide bar can be returned by way of a spring or by a second strip which is deflected in similar manner as the first strip by a displacing element. In one embodiment, a single displacing element is used for deflecting purposes while in other embodiments, a multiplicity of displacing elements are used. The strips may be attached directly to the guide bar or indirectly, for example, over a pivotally mounted lever. |
